Nanostructured TiO 2 thin films: Synthesis and characterisations

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dc.authorid0000-0001-9852-7246en_US
dc.authorid0000-0002-6011-3504en_US
dc.contributor.authorAkın, Seçkin
dc.contributor.authorSönmezoğlu, Savaş
dc.date.accessioned2019-12-06T20:30:01Z
dc.date.available2019-12-06T20:30:01Z
dc.date.issued2012
dc.departmentKMÜ, Kamil Özdağ Fen Fakültesi, Fizik Bölümüen_US
dc.description.abstractIn the present study, TiO 2 thin film was fabricated by sol-gel dip coating technique, and the structural, optical and dielectric characteristics of the film have been investigated to identify the basic characteristics. By the help of the X-ray diffraction spectrum, the structural parameters of the nanostructured TiO 2 thin film, such as lattice constants, texture coefficient and crystallite size, were analysed. The value of crystallite size has been evaluated by the Debye-Scherrer and Williamson-Hall methods and also estimated from the field emission SEM images. There was a consistency for the values of crystallite size obtained from all the methods. Swanepoel's method and transmittance measurements were used to analyse the optical parameters of the TiO 2 thin film. Film thickness, refractive index n, extinction coefficient k, band gap energy Eg and Urbach energy E u have been determined as 264·03 nm, 2·67, 0·067, 3·22 eV and 0·127 eV respectively. It is seen that the real and imaginary parts of the static dielectric constants follow the same pattern and have the values of the real part (7·436 at 655 nm) higher than the imaginary parts (0·038 at 655 nm). Moreover, the Spitzer-Fan model was used for investigation of the values of high frequency dielectric constant ?? and free optical carrier concentration N opt. Furthermore, the dissipation factor and optical conductivity of the TiO 2 thin film were examined. These results show that understanding the fundamental characteristics of this structure may be of great help in improving the quality of TiO 2 for the future of the optoelectronic device technology.en_US
dc.identifier.citationAkın, S., & Sönmezoğlu, S. (November 01, 2012). Nanostructured TiO 2 thin films: synthesis and characterisations. Materials Technology, 27, 5, 342-349.
dc.identifier.doi10.1179/1753555712Y.0000000017
dc.identifier.endpage349en_US
dc.identifier.issn1066-7857
dc.identifier.issue5en_US
dc.identifier.scopus2-s2.0-84868022156
dc.identifier.scopusqualityQ1
dc.identifier.startpage342en_US
dc.identifier.urihttps://dx.doi.org/10.1179/1753555712Y.0000000017
dc.identifier.urihttps://hdl.handle.net/11492/1909
dc.identifier.volume27en_US
dc.identifier.wosWOS:000309970700002
dc.identifier.wosqualityQ4
dc.indekslendigikaynakWeb of Sceince
dc.indekslendigikaynakScopus
dc.institutionauthorAkın, Seçkin
dc.institutionauthorSönmezoğlu, Savaş
dc.language.isoen
dc.relation.journalMaterials Technologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectDielectric Constanten_US
dc.subjectNanostructured TiO 2 Thin Filmsen_US
dc.subjectRefractive Indexen_US
dc.subjectSwanepoel's Methoden_US
dc.subjectWilliamson-Hall Ploten_US
dc.titleNanostructured TiO 2 thin films: Synthesis and characterisationsen_US
dc.typeArticle

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